K-B镜面形高精度检测技术研究进展 -

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K-B镜面形高精度检测技术研究进展

doi:10.37188/CO.2019-0231

张帅^{1, 2,},
侯溪^1,,

1.
中国科学院光电技术研究所，四川成都 610209
2.
中国科学院大学，北京 100049

基金项目:国家自然科学基金面上资助项目(No. 61675209)

详细信息

作者简介:
张　帅(1994—)，男，河南平顶山人，硕士研究生，2018年于长春理工大学获得学士学位，主要从事高精度X射线光学元件面形检测装置研究。Email：zhangshuai18@mails.uacs.ac.cn
侯　溪(1980—)，男，四川阆中人，博士，研究员，博士生导师，2002年于电子科技大学获得学士学位，2007年于中国科学院研究生院获得博士学位，主要从事高精度光学检测技术研究及仪器研制。Email：hxxh6776@163.com

中图分类号:TN247
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出版历程
- 收稿日期:2019-12-04
- 修回日期:2020-01-13
- 刊出日期:2020-08-01

Research progress of high-precision surface metrology of a K-B mirror

ZHANG Shuai^{1, 2,},
HOU Xi^1,,

1.
Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China
2.
University of Chinese Academy of Sciences, Beijing 100049, China

Funds:Supported by General Program of National Natural Science Foundation of China (No. 61675209)

More Information

Corresponding author:hxxh6776@163.com

摘要

摘要:以新一代同步辐射光源和全相干X射线自由电子为代表的先进光源已成为众多学科领域中一种不可或缺的研究工具。先进光源技术不断进步，驱动超精密光学制造快速发展，先进光源中关键聚焦光学元件K-B镜的面形精度是影响光源性能的重要指标，要求其在几十纳弧度以下。然而，高精度K-B镜面形检测技术依然存在较大技术挑战，一直是国内外研究热点。本文介绍了反射式轮廓测量技术即长程轮廓仪（LTP）、纳米测量仪（NOM）以及拼接干涉检测技术等典型K-B镜面形检测技术的基本原理，对比分析了其技术特点，综述了国内外K-B镜面形检测技术的研究现状和最新进展，对发展趋势进行了展望。
- X射线光学/
- K-B镜/
- 光学测量/
- 面形检测/
- 拼接干涉
Abstract:The advanced light source represented by the new generation of the diffraction limit synchrotron radiation source and the full-coherent X-ray free-electron laser has become an indispensable research tool in many fields. The continuous development of advanced light sources drives the rapid progress of ultra-precision optical manufacturing. The surface precision of a K-B mirror, a key focusing optical element in advanced light sources, is an important factor, which should be less than tens of nano radians. However, high precision K-B mirror surface metrology still has great technical challenges and is now a research hotspot in the scientific community. This paper introduces typical K-B mirror surface metrology, including reflection profile measuring technology such as the Long Trace Profiler (LTP), the Nanometer Optical component Measuring (NOM), and stitching interference metrology. Current K-B mirror surface shape technologies are summarized and the upcoming research progress is prospected.
- X-ray optics/
- K-B mirror/
- optical measurement/
- surface metrology/
- stitching interferometer

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图 1(a)经典一维K-B镜和(b)具有二维弯曲的K-B镜

Figure 1.(a) Typical K-B mirror and (b) K-B mirror with two-dimensional bending

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图 2LTP光学系统原理图

Figure 2.Principle diagram of LTP optical system

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图 3NOM原理图^[16]

Figure 3.Principle diagram of NOM system^[16]

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图 4拼接原理图

Figure 4.The principle of stitching

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图 5曲率变化剧烈的柱面镜的干涉条纹图

Figure 5.Interference fringe pattern of cylindrical mirror with sharp curvature change

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图 6LTP/NOM发展历程^{[16,21,23,25,27,28]}

Figure 6.The development of LTP/NOM^{[16,21,23,25,27,28]}

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图 7(a) ESRF中的拼接干涉仪及其(b)测量过程^[40]

Figure 7.(a) Fizeau stitching interferometer at ESRF and its (b) measurement process^[40]

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图 8SPring-8中的MSI原理图^[43]

Figure 8.Diagram of microstitching interferometry at SPring-8^[43]

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图 9ESRF中的MSI装置^[46]

Figure 9.Microstitching interferometry at ESRF^[46]

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图 10SOLEIL中Michelson型显微拼接干涉仪^[47]

Figure 10.Michelson stitching interferometry at SOLEIL^[47]

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图 11(a) RADSI装置图及其 (b) 测量过程^[48]

Figure 11.(a) Scheme of RADSI system and (b) its measurement process^[48]

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图 12RADSI发展路线图^{[42,48,50,52]}

Figure 12.The development of RADSI^{[42,48,50,52]}

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图 132D-TSI装置原理图^[57]

Figure 13.The scheme of 2D-TSI device^[57]

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图 14先进光源硬X射线聚焦尺寸演变

Figure 14.The trend of hard X-ray focusing size

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图 15K-B镜面形精度趋势^[36]

Figure 15.The trend of K-B mirror shape accuracy^[36]

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图 16K-B镜面形检测技术发展过程图

Figure 16.Development of K-B mirror surface metrology

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表 1LTP/NOM技术典型参数

Table 1.Specifications of LTP/NOM

类型	LTP	NOM
工作距离/mm	100~1100	300~1300
斜率/mrad	±5	±5
扫描速率/(mm·s⁻¹)	5~10	2~4
精度(RMS)/nrad	平面: ~50 曲面: ~250	平面: ~50 曲面: ~500
空间分辨率/mm	~1	2.5~5

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表 2国内外典型LTP/NOM技术参数

Table 2.Technical specifications of typical LTP/NOM technologies at home and abroad

类型	机构/装置	设备	时间	测量范围	性能	备注
LTP	日本JASRI/SPring-8	Laser-LTP	2014	3.6 mrad	0.2 μrad 重复精度60 nrad	校准测头误差分辨率30 nrad
	日本JASRI/SPring-8	LTP	2016	~1 m	5 nm	新型斜率传感器; 空间分辨率<1 mm
	美国LBNLALS	LTP-II⁺	2014	1 m ±2.5 mrad	平面：<80 rad rms 曲面(>15 m): 250 nrad rms	校正K-B位置误差
	中国台湾NSRRC	NLTP	2013	1.2 m	测量重复精度50 nrad	定位基准为衍射暗线；光束定位精度高
	中国SSRF上海光源	LTP	2016	1 m	平面：<50 nrad 曲面(>38 m): 0.27μrad	支持快速测量
	中国IHEP高能所	FSP	2019	1 m	平面:25 nrad rms 曲面(3 mrad): 32 nrad rms	空间分辨率优于1 mm
NOM	巴西LNLS	NOM	2017	1.5 m	平面：50 nrad rms	横向分辨率大
	德国BESSY-II	Diamond-NOM	2014	1.5 m ±5 mrad	平面：50 nrad rms 曲面：200 nrad rms (±24μrad) 500 nrad rms (±5 mrad)	曲率测量范围大
	美国BNL	DLTP	2014	1 m ±4.6 mrad	平面：60 nrad rms 曲面(>15 m): 200 nrad rms	曲面测量受限
	美国BNL	OSMS	2017	1.2 m	平面：<50 nrad rms 曲面(>60 m): 100 nrad rms	实现二维测量
	日本JASRI/SPring-8	AC-NOM	2014	9.7 mrad	±1.2μrad ±0.24μrad (48μrad) 重复精度100 nrad rms	校准扫描俯仰误差; 扫描速度慢分辨率24.2 nrad
	中国SSRF上海光源	NOM	2015	1100 mm ±5 mrad	0.08μrad rms (±50μrad) 0.25μrad rms (±5 mrad)	空间采样频率在1~10 mm 重复精度50 nrad rms

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表 33种类型拼接干涉仪对比^[40,51,56]

Table 3.Comparison of three types of stitching interferometer^[40,51,56]

主动角控制拼接干涉仪控制算法+精密转台	测角拼接干涉仪测角系统(RADSI)	测角辅助拼接干涉仪测角辅助装置+拼接算法


大口径、小曲率长焦K-B镜 300~1000 mm; <20 mrad	小口径、大曲率短焦K-B镜 100~300 mm; >20 mrad	平面镜、小曲率椭圆柱镜(探索阶段)
平面优于0.30 nm rms 曲面优于0.30 μrad rms 步进单孔径测量(干涉仪尺寸)	平面优于0.2 nm rms 曲面优于2 nm rms 步进单孔径测量: 2 mm×2 mm	重复精度1.5 nm rms 步进单孔径量: 2 mm×2 mm
结构相对简单，测量口径范围大，测量效率高测量频段有限，测量精度受待测面曲率影响大	测量频段宽，测量精度高，曲率测量范围大，结构复杂，易受环境影响，测量口径范围受限	结构简单，动态范围大，测量精度高有待进一步完善具体结构

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表 4国内外典型拼接干涉仪技术参数

Table 4.Technical parameters of typical stitching interferometer at home and abroad

机构/装置	设备	时间	技术性能	备注
欧洲ERSF	Fizeau-SI	2019	平面镜：优于0.30 nm rms 椭面镜：优于0.30 μrad rms 球面镜：优于0.25 μrad rms	主镜法校正参考误差需弥补球面低频信息空间分辨率: 80 μm
欧洲ERSF	MSI	2019	平面: 0.2 nm rms 横向分辨率: (2.5倍) 16 μm; (1倍) 40 μm	适合于平面或强弯短镜；存在拼接伪影
美国BNL	MSI	2017	残余斜率偏差: 2 μrad rms	采用曲率拼接技术
美国BNL	ASI-AMS	2018	平面：重复精度0.5 nm rms 椭球面：重复精度2 nm rms	可以减小回程误差; 子孔径重叠面积小，测量速度快
日本大阪大学	MSI-RADSI	2016	面型高度误差：3 nm rms 重复精度:0.51 nm rms	可测极端曲率面形以及椭面镜；测量范围有限
法国SOLEIL	Mich-SI	2019	重复精度:0.2 nm rms	可测20 mm⁻¹频段面形信息
复旦大学	RADSI	2017	平面镜：重复精度0.5 nm rms 球面镜：曲率偏差为2.3%	验证了RADSI球面测量能力
国防科技大学	DST	2018	测量PV值8 nm；重复精度达到1.5 nm rms	一维测量;双扫描间隔; 减小回程误差及参考误差

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