光纤光栅外腔器光学薄膜的研制 -

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光纤光栅外腔器光学薄膜的研制

游道明^{1, 2,},
谭满清^{1, 2,,},
郭文涛^1,,,
曹营春¹,
王子杰¹,
杨秋蕊¹,
万丽丽¹,
王鑫¹,
刘珩¹

1.
中国科学院半导体研究所集成光电子学国家重点实验室，北京 100083
2.
中国科学院大学材料科学与光电技术学院，北京 100049

中图分类号:TN248.4
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- 被引次数:0
出版历程
- 收稿日期:2022-07-07
- 修回日期:2022-07-22
- 网络出版日期:2022-09-27

Design and fabrication of an optical film for fiber bragg grating external cavity diode lasers

doi:10.37188/CO.EN.2022-0010

1.
State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
2.
School of Materials Science and Opto-electronics Technology, University of Chinese Academy of Sciences, Beijing 100049, China

Funds:Supported by the Science & Technology Program of the State Grid Corporation of China Co., Ltd. (No. 5700-202058482A-0-0-00)

More Information

Author Bio:
YOU Dao-ming (1998—), born in Dexing, Jiangxi Province, got his BS from Harbin Institute of Technology in 2020. Now he is a postgraduate student at the University of Chinese Academy of Science and Institute of semiconductors. His research focuses on semiconductor optoelectronic devices and integration technology. E-mail:youdaoming20@semi.ac.cn
TAN Man-qin (1967—), born in Hengyang, Hunan Province, got his Ph.D. from the Beijing Institute of Technology in 1996. Now he is a research fellow at the Institute of Semiconductors, CAS, and he is also a professor at the University of Chinese Academy of Science. His research focuses on semiconductor optoelectronic devices and modules for sensing. E-mail:mqtan@semi.ac.cn
GUO Wen-tao (1987—), born in Hengyang, Shanxi Province, got his Ph.D. from the Institute of Semiconductors in 2014. Now he is a research assistant at the Institute of Semiconductors, CAS. His research focuses on semiconductor optoelectronic devices and modules for sensing. E-mail:wtguo@semi.ac.cn

Corresponding author:mqtan@semi.ac.cn;wtguo@semi.ac.cn

摘要

摘要:
腔面光学薄膜是光纤光栅外腔器（ECL）的关键结构，平面波方法（PWM）被广泛应用于腔面光学薄膜的设计，然而该设计在ECL中的实际应用效果往往并不理想。本文在使用PWM方法时通过时域有限差分法分析其中的原因，并考虑腔面尺寸和结构影响。仿真结果显示，PWM设计存在反射率差和反射曲线偏移等问题，实际的反射特性显著偏离设计值。因此本文重点优化了薄膜设计，并采用磁控溅射工艺镀膜。测量结果显示，优化后增透膜的反射率降低了30%，高反膜反射率增至96%以上，所制备的ECL的光纤输出功率超过650 mW。本文研究结果为ECL和其他半导体光电子器件的腔面光学薄膜研制提供了参考。
- 外腔器/
- 光学薄膜/
- 时域有限差分/
- 腔面镀膜
Abstract:
The cavity surface optical film is one of the most crucial components of the fiber bragg grating External Cavity diode Laser (ECL). Although, the Plane Wave Method (PWM) is widely used in the optical film preparation, it is not an ideal design method when applied in ECL preparation. The Finite-Difference Time-Domain (FDTD) method is used to analyze this problem by taking the effect of facet dimensions and structure into account. According to the simulation, PWM suffers from poor reflectivity and deviation of the reflection curve, which significantly affects performance. Therefore, the optical film design is optimized and verified by experiments. Magnetron sputtering is used to fabricate the optical film, which is then applied to ECL. The measurement results show that the reflectivity of Anti-Reflection (AR) film is reduced by 30% after optimization, while the reflectivity of High-Reflection (HR) film increased to 96%. The prepared ECL’s fiber output power exceeds 650 mW. In this paper, the optical film suitable for ECL is designed and fabricated, and provides a reference for optical films in ECLs and other semiconductor optoelectronic devices.
- external cavity diode lasers/
- optical film/
- finite-difference time-domain/
- facet coating

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Figure 1.(a) The simulation model; (b) schematic diagram of simplified facet; (c) schematic diagram of asymmetric structure; (d) linear and parabolic refractive index distributions

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Figure 2.Reflectivity of optical films on various-sized facets at 980 nm. (a) AR film; (b) HR film

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Figure 3.The reflection curves of AR film. (a) Single-layer; (b) double-layer

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Figure 4.Reflectivity of HR film under different HL logarithms, the insert is the reflection curves of 5 pairs of HR film

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Figure 5.Reflectivities of different optical films on ASOC and SOC facets. (a) AR film; (b) HR film

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Figure 6.Reflectivity sweep at various film thicknesses. (a) AR film; (b) HR film

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Figure 7.Reflection curves of optical films before and after optimization. (a) AR film; (b) HR film

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Figure 8.Reflection curves of optimized optical films on GaAs wafer. (a) AR film; (b) HR film

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Figure 9.Surface images of the optical film

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Figure 10.Statistical diagram of LD parameters of single facet coating. (a) Output power of the front and rear facets; (b) power ratio of the front and rear facets

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Figure 11.(a) Superradiation spectrum and (b) statistical diagram of the ripple index

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Figure 12.Performance of ECL with optimized optical films (a) Spectrum curve; (b) power-current-voltage (PIV) curve

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Table 1.Structural parameters of the simulation model

Parameter	Typical value and range
Core layer thickness (H_core)	0.5 μm/0.05−1 μm
Core layer width (L_core)	1 μm/0.2−2 μm
Core layer refractive index (n_core)	3.4902−3.6
Cladding refractive index (n_clad)	3.4902
Refractive index difference ($\Delta n$)	3%

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