Techniques of radiation contamination monitoring for extreme ultraviolet devices
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摘要:总结并讨论了极紫外光刻技术中,有关极紫外光学器件受辐照污染的在线检测方法。简要介绍了极紫外光刻系统的原理、反射镜膜层结构以及表面污染产生的机理;指出光刻系统中在线检测的技术要求;分析了目前几种主要表面检测技术的特点;给出了每种方法在极紫外光学系统中的应用潜力;最后,指出光纤椭偏仪在极紫外光学系统的在线表面污染检测中具有良好的应用前景。Abstract:This paper reviews the in situ surface analysis and monitoring techniques for contamination induced in Extreme Ultraviolet Lithography(EUVL). It introduces the EUV lithography, reflective multilayer mirror and the mechanism of carbon contamination induced by EUV. It points out the requirement of the in situ surface analysis techniques in EUV lithography. The mainly surface analysis techniques are discussed. Analyzed results show the applied potentiality of each measurement used in the EUV optical system. Finally, it points out that the Fiber-based ellipsometry has further application prospect in in situ surface contamination monitoring of EUV lithography.
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