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High-speed 850 nm vertical-cavity surface-emitting lasers with BCB planarization technique

HE Xiao-ying,DONG Jian,HU Shuai,HE Yan,LV Ben-shun,LUAN Xin-xin,LI Chong,胡 安琪,HU Zong-hai,GUO Xia

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何晓颖, 董建, 胡帅, 何艳, 吕本顺, 栾信信, 李冲, 胡宗海, 郭霞. 采用BCB平整技术的高速850 nm垂直面发射 器[J]. , 2018, 11(2): 190-197. doi: 10.3788/CO.20181102.0190
引用本文: 何晓颖, 董建, 胡帅, 何艳, 吕本顺, 栾信信, 李冲, 胡宗海, 郭霞. 采用BCB平整技术的高速850 nm垂直面发射 器[J]. , 2018, 11(2): 190-197.doi:10.3788/CO.20181102.0190
HE Xiao-ying, DONG Jian, HU Shuai, HE Yan, LV Ben-shun, LUAN Xin-xin, LI Chong, 胡 安琪, HU Zong-hai, GUO Xia. High-speed 850 nm vertical-cavity surface-emitting lasers with BCB planarization technique[J]. Chinese Optics, 2018, 11(2): 190-197. doi: 10.3788/CO.20181102.0190
Citation: HE Xiao-ying, DONG Jian, HU Shuai, HE Yan, LV Ben-shun, LUAN Xin-xin, LI Chong, 胡 安琪, HU Zong-hai, GUO Xia. High-speed 850 nm vertical-cavity surface-emitting lasers with BCB planarization technique[J].Chinese Optics, 2018, 11(2): 190-197.doi:10.3788/CO.20181102.0190

采用BCB平整技术的高速850 nm垂直面发射 器

基金项目:

国家自然科学基金资助项目61335004

国家自然科学基金资助项目61675046

国家自然科学基金资助项目61505003

国家重大研发计划2016YFB0400603

国家重大研发计划2017YFB0400902

国家重大研发计划2017YFF0104801

详细信息
    作者简介:

    何晓颖(1981-), 女, 湖北荆州人, 博士, 副教授, 2009年于华中科技大学获得博士学位, 主要从事半导体 器、光纤 器、石墨烯光电子器件等新型光电子器件的研究工作

    郭霞(1974—),女,山东青岛人,博士,教授,1996年于聊城大学获得学士学位,2003年于北京工业大学获得博士学位,主要从事半导体 器、发光二极管等光电子器件方面的研究。E-mail:guox@bupt.edu.cn

  • 中图分类号:TN248.4

High-speed 850 nm vertical-cavity surface-emitting lasers with BCB planarization technique

doi:10.3788/CO.20181102.0190
Funds:

National Natural Science Foundation of China61335004

National Natural Science Foundation of China61675046

National Natural Science Foundation of China61505003

National Key R&D Program of China2016YFB0400603

National Key R&D Program of China2017YFB0400902

National Key R&D Program of China2017YFF0104801

More Information
  • 摘要:垂直腔面发射 器因其具有低阈值、低功耗、可实现高速调制等优势,广泛地应用于光通信和光互连等领域。寄生电容是影响 器的调制带宽的主要因素之一。本文通过采用低 k值的苯并环丁烯(BCB)平整技术有效地降低了垂直腔面发射 器的寄生电容。详细研究了BCB平整技术的最优工艺参数,为未来高速垂直腔面发射 器的制造技术提供参考。低 k值BCB平整垂直腔面发射 器在7 μm氧化孔径下3 dB小信号调制带宽可达15.2 GHz。

  • Figure 1.(a) Simulation results of small signal modulation response for VCSELs with BCB and SiO2passivation. The parasitic cutoff frequency can reach to 17.8 GHz and 10.6 GHz for BCB and SiO2-passivated VCSEL, respectively. (b)The measured small signal modulation response for VCSELs with BCB and SiO2passivation. The -3dB bandwidth is 15.2 GHz and 9.85 GHz with the oxide aperture of 7 μm@6 mA, respectively, which indicates the parasitic capacitance limits the modulation frequency of the devices

    Figure 2.(a) Schematic cross-sectional structure of high-speed VCSEL devices. (b)Top-view image of the high-speed VCSEL with coplanar GSG electrode structure

    Figure 3.(a) Relationship between spin speed and film thickness of BCB. (b)Difference in aperture diameter(Δd) between lithography and BCB patterns at various exposure times. (c)Top-view images of the thin BCB layer before dry etching and (d)after dry etching

    Figure 4.(a) Static P-I-V characteristics of BCB-planarized VCSELs with a 5 μm and 7 μm oxide aperture at room temperature. (b)Electrical-luminescence spectrum for the VCSEL at room temperature and current injection of 10.0 mA

    Figure 5.Small-signal modulation response at room temperature at different bias currents for the BCB-planarized VCSEL with (a)5 μm and (b)7 μm oxide aperture

    Figure 6.(a) Plot of the resonance frequency for the VCSELs with 5 μm and 7 μm oxide aperture versus the square root of the current injection above the threshold current at room temperature. (b)Damping rate versus resonance frequency square for the VCSELs with 5 μm and 7 μm oxide aperture at room temperature

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出版历程
  • 收稿日期:2017-11-17
  • 修回日期:2017-12-16
  • 刊出日期:2018-04-01

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