Sep. 2021

Article Contents

Chinese Optics> 2021> 14(5): 1104-1119.

ZHONG Zhi-jian, LI Chen-yi, LI Shi-guang, GUO Lei, WEI Ya-yi. Budget analysis of focus control in advanced lithography (I) -optical path[J]. Chinese Optics, 2021, 14(5): 1104-1119. doi: 10.37188/CO.2021-0033

Citation:

ZHONG Zhi-jian, LI Chen-yi, LI Shi-guang, GUO Lei, WEI Ya-yi. Budget analysis of focus control in advanced lithography (I) -optical path[J].Chinese Optics, 2021, 14(5): 1104-1119.doi:10.37188/CO.2021-0033

Citation:

ZHONG Zhi-jian, LI Chen-yi, LI Shi-guang, GUO Lei, WEI Ya-yi. Budget analysis of focus control in advanced lithography (I) -optical path[J].Chinese Optics, 2021, 14(5): 1104-1119.doi:10.37188/CO.2021-0033

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Budget analysis of focus control in advanced lithography (I) -optical path

doi:10.37188/CO.2021-0033

ZHONG Zhi-jian^{1, 2,},
LI Chen-yi^{1, 2},
LI Shi-guang^{1, 2, 3,,},
GUO Lei^{1, 2, 3},
WEI Ya-yi^{1, 2}

1.
Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China
2.
University of Chinese Academy of Sciences, Beijing 100049, China
3.
Jiangsu Yingsu Integrated Circuit Equipment Co., Ltd, Wuxi 214142, China

Funds:Supported by National Natural Science Foundation of China (No. 61804174; No. 61604172)

More Information

Corresponding author:lishiguang@tsinghua.org.cn
Received Date:01 Feb 2021
Rev Recd Date:08 Mar 2021

Available Online:30 Apr 2021

Publish Date:18 Sep 2021

Abstract

Abstract

As the technology node of large-scale integrated circuits continues to shrink, the focus control of the lithographic tools becomes particularly difficult. In order to ensure the exposure quality of wafers, it is necessary to quickly and accurately adjust the wafer in the Depth of Focus (DOF) to a degree as small as few dozen of nanometers. For this reason, people need to carefully analyze the various factors that cause defocusing or process window changes in the lithographic process, make a reasonable focus control budget, and control the various error factors within a certain range. This paper focuses on Extreme Ultraviolet (EUV) lithography, reviews the factors that affect focus control in the optical path of an advanced EUV lithographic tool and summarizes their principles, simulation and experimental results. It can provide a reference when conducting advanced lithography focus control budget research.
- focus control,
- lithography,
- budget,
- best focus,
- depth of focus,
- process window

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References (58)

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