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摘要:为了减少短波蓝光对人眼的伤害,同时确保蓝光对人体节律的有益调节,精确控制400~500 nm的透射斜率在蓝光防护中尤为重要。本文提出非线性玻尔兹曼函数拟合长波通薄膜的方法,分别通过非线性及线性光谱目标值优化得到膜系结构(Z1)和(Z2)。通过对比(Z1)和(Z2)薄膜的光谱和导纳图,分析可知经非线性目标值优化后的薄膜具有可控的斜率和更好的通带光谱性能。采用电子束蒸发离子束辅助沉积方法制备了14层蓝光防护薄膜,其光谱性能满足新国标GB/T38120—2019的技术要求。结果表明,所制备的单面光学多层薄膜在紫外385~415 nm的平均透过率小于3.2%,高能蓝光415~445 nm的平均透过率小于30.88%,有益蓝光445~475 nm的透过率大于81.9%,在剩余可见光波段的透过率大于95.5%。该方法为蓝光防护提供了一个新的解决方案,对于视觉防护、移动终端、眼镜、电脑桌面、移动数字屏幕等有潜在应用价值。Abstract:To reduce the damage to human eyes and ensure the beneficial regulation of the human rhythm by short-wave blue light, accurate control of the transmission slope of the 400~500 nm wavelength is particularly important in blue light protection. In this paper, a nonlinear Boltzmann function fitting method for long wave-pass thin films is proposed, and thin films (Z1) and (Z2) are obtained by optimizing the nonlinear and linear target, respectively. Admittance and transmittance diagrams of thin films (Z1) and (Z2) are shown that the thin film optimized by a nonlinear target has a controllable slope and better passband spectral performance. The blue-blocking thin film of 14 layers is fabricated using electron-beam evaporation assisted by an ion beam, which met the technical requirements of the new GB/T38120—2019 national standard. The results present that the average transmittance of the single-side thin film is less than 3.2% at 385~415 nm, less than 30.88% at 415~445 nm, more than 81.9% at 445~475 nm, and more than 95.5% at 500~800 nm. These promising results indicate that this design method provide a new solution for vision protection applications such as eyeglasses, computer desktop and mobile digital screens.
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表 1GB/T38120—2019蓝光防护膜的光透射比要求
Table 1.Light transmittance requirement of blue-blocking protective thin films according to GB/T38120—2019
光谱范围λ/nm 光透射比要求 385≤λ<415 <75% 315≤λ<445 ≤80% 445≤λ<475 >80% 475≤λ<505 >80% 表 2玻尔兹曼目标值参数取值
Table 2.Values of Boltzmann target parameter
拟合函数 Boltzmann $y = {a_2} + \dfrac{ { {a_1} - {a_2} } }{ {1 + {e^{({{x} } - { {{x} }_0})/{{{\rm{d}}x} } } } } }$ 参数 A1 B1 C1 D1 A2 B2 C2 D2 A1 0 0 0 0 0 0 0 0 A2 100 100 100 100 100 100 100 100 X0 460 440 420 400 460 440 420 400 dx 10 10 10 10 30 30 30 30 表 3TiO2和SiO2单层膜的光学常数
Table 3.Optical constants of the TiO2and SiO2thin films
光学常数 波长(nm) TiO2 SiO2 n k n k 400 2.6 0.0001 1.48 0 450 2.51 0 1.47 0 500 2.44 0 1.47 0 550 2.39 0 1.467 0 600 2.37 0 1.46 0 650 2.34 0 1.46 0 -
[1] 杨超普, 方文卿, 王昭, 等. 不同显示器的蓝光危害及节律效应比较[J]. 与光电子学进展,2017,54(12):121701.YANG CH P, FANG W Q, WANG ZH,et al. Comparison on blue light hazard and circadian effect of different displays[J].Laser&Optoelectronics Progress, 2017, 54(12): 121701. (in Chinese) [2] 王晓瑜, 陈东川, 朱书贤, 等. 防蓝光显示技术进展[J]. 液晶与显示,2020,35(1):1-11.doi:10.3788/YJYXS20203501.0001WANG X Y, CHEN D CH, ZHU SH X,et al. Progress of anti-blue light hazard in display technology[J].Chinese Journal of Liquid Crystals and Displays, 2020, 35(1): 1-11. (in Chinese)doi:10.3788/YJYXS20203501.0001 [3] 姜玉刚, 刘华松, 王利栓, 等. 卫星 防护薄膜窗口的设计与制备技术研究[J]. 中国光学,2019,12(4):804-809.doi:10.3788/co.20191204.0804JIANG Y G, LIU H S, WANG L SH,et al. Design and preparation technology of laser protective film window of satellite[J].Chinese Optics, 2019, 12(4): 804-809. (in Chinese)doi:10.3788/co.20191204.0804 [4] 张忠义, 徐日宏, 张振华, 等. 防蓝光纳米薄膜的磁控溅射制备技术及性能研究[J]. 真空,2017,54(5):35-38.ZHANG ZH Y, XU R H, ZHANG ZH H,et al. Study on preparation technology and properties of anti blue-light nano films by magnetron sputtering[J].Vacuum, 2017, 54(5): 35-38. (in Chinese) [5] 李候俊, 徐均琪, 王建, 等. 近红外 薄膜滤光片的研制[J]. 光子学报,2019,48(9):0931001.doi:10.3788/gzxb20194809.0931001LI H J, XU J Q, WANG J,et al. Fabrication of near-infrared laser film filter[J].Acta Photonica Sinica, 2019, 48(9): 0931001. (in Chinese)doi:10.3788/gzxb20194809.0931001 [6] 宫大为, 付秀华, 耿似玉, 等. 红外双波段 滤光膜的研制[J]. 中国光学,2011,4(3):293-298.doi:10.3969/j.issn.2095-1531.2011.03.012GONG D W, FU X H, GENG S Y,et al. Design and manufacture of infrared double waveband laser filter films[J].Chinese Optics, 2011, 4(3): 293-298. (in Chinese)doi:10.3969/j.issn.2095-1531.2011.03.012 [7] 刘冬梅, 黄宏, 付秀华, 等. 深紫外全介质反射式滤光膜的研究[J]. 光子学报,2018,47(10):1031002.doi:10.3788/gzxb20184710.1031002LIU D M, HUANG H, FU X H,et al. Research of deep ultraviolet dielectric reflective filter film[J].Acta Photonica Sinica, 2018, 47(10): 1031002. (in Chinese)doi:10.3788/gzxb20184710.1031002 [8] 唐晋发, 顾培夫, 刘旭, 等. 现代光学薄膜技术[M]. 杭州: 浙江大学出版社, 2006.TANG J F, GU P F, LIU X,et al..Modern Optical Thin Film Technology[M]. Hangzhou: Zhejiang University Press, 2006. (in Chinese) [9] 李资政, 杨海贵, 王笑夷, 等. 基于聚类全局优化算法的薄膜设计优化技术的研究[J]. 光学学报,2015,35(9):0931001.doi:10.3788/AOS201535.0931001LI Z ZH, YANG H G, WANG X Y,et al. Investigations of thin film design and optimization based on clustering and global optimization algorithm[J].Acta Optica Sinica, 2015, 35(9): 0931001. (in Chinese)doi:10.3788/AOS201535.0931001 [10] 顾培夫, 陈海星, 艾曼灵, 等. TiO2膜消光系数的确定及制备参量的影响[J]. 光学学报,2005,25(7):1005-1008.doi:10.3321/j.issn:0253-2239.2005.07.028GU P F, CHEN H X, AI M L,et al. Determination of the extinction coefficient of TiO2and effect of preparation parameters[J].Acta Optica Sinica, 2005, 25(7): 1005-1008. (in Chinese)doi:10.3321/j.issn:0253-2239.2005.07.028 [11] 袁文佳, 沈伟东, 郑晓雯, 等. 离子束溅射制备Nb2O5、Ta2O5和SiO2薄膜的光学、力学特性和微结构[J]. 光学学报,2017,37(12):1231001.YUAN W J, SHEN W D, ZHENG X W,et al. Optical and mechanical properties and microstructures of Nb2O5, Ta2O5and SiO2thin films prepared by ion beam sputtering[J].Acta Optica Sinica, 2017, 37(12): 1231001. (in Chinese) [12] FANG M, HU D F, SHAO J D. Evolution of stress in evaporated silicon dioxide thin films[J].Chinese Optics Letters, 2010, 8(1): 119-122.doi:10.3788/COL20100801.0119 [13] 冯毓材, 冯隽, 刘强. 辅助镀膜用K系列强流宽束考夫曼离子源[J]. 与红外,2006,36(12):1168-1170.doi:10.3969/j.issn.1001-5078.2006.12.026FENG Y C, FENG J, LIU Q. K series broad beam ion sources for the optical thin film assisted deposition[J].Laser&Infrared, 2006, 36(12): 1168-1170. (in Chinese)doi:10.3969/j.issn.1001-5078.2006.12.026