同步辐射用36单元压电变形镜研制及其面形调控研究 -

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同步辐射用36单元压电变形镜研制及其面形调控研究

doi:10.37188/CO.2021-0103

1.
中国科学技术大学国家同步辐射实验室，安徽合肥 230029
2.
中国科学院西安光学精密机械研究所，陕西西安 710119
3.
中国科学院上海硅酸盐研究所，上海 200050
4.
中国科学院上海高等研究院，上海 201204

基金项目:国家重点研发计划（No. 2016YFA0401004）

详细信息

作者简介:
袁德波（1996—），男，安徽六安人，中国科学技术大学国家同步辐射实验室硕士研究生，2019年于南京理工大学获得学士学位，主要从事压电变形镜方面的研究。E-mail：yuandebo@mail.ustc.edu.cn
张国斌（1967—），男，江苏常熟人，博士，研究员，博士生导师，1990年、2001年于中国科学技术大学分别获得学士、博士学位，主要从事氧化物量子功能材料制备与物性、同步辐射光学工程、X射线自适应光学的研究。E-mail：gbzhang@ustc.edu.cn

中图分类号:TN384; O434
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出版历程
- 收稿日期:2021-05-10
- 修回日期:2021-05-26
- 网络出版日期:2021-07-02
- 刊出日期:2021-11-19

Development of a 36-element piezoelectric deformable mirror for synchrotron radiation and its surface control ability

1.
National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China
2.
Xi'an Institute of Optics and Precision Mechanics,Chinese Academy of Sciences, Xi’an 710119,China
3.
Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China
4.
Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201204, China

Funds:Supported by National Key R&D Program of China (No. 2016YFA0401004)

More Information

Corresponding author:gbzhang@ustc.edu.cn

摘要

摘要:第4代同步辐射光源及自由电子装置中束线光学系统对光学元件性能提出了苛刻的要求。使用压电变形镜是实现超高面形精度调控和实施波前补偿的有效途径，也是目前亟需突破的国产化技术瓶颈。针对这一问题，研制了长度为200 mm、含36个单元压电促动器的压电变形镜。通过数值模拟优化了变形镜结构参数，利用国产工艺完成了变形镜样机的制作，并对其面形调控能力进行初步探究。测试结果表明：所研制变形镜样机的平面面形误差可降低至1.38 nm (rms)，斜率误差降低至240 nrad (rms)，实现了平面面形的nm级调控。
- 压电变形镜/
- 面形误差/
- 同步辐射/
- 自适应光学
Abstract:Ultra-high quality optical elements are demanded by beamlimes on fourth-generation synchrotron facilities and free-electron laser facilities. A bimorph mirror is effectively used to achieve ultra-high-precision surface profile control and wavefront correction, yet it’s one of the bottlenecks of domestic techniques and must be overcome. In order to accomplish this, a 200 mm long bimorph mirror with 36 elements of piezoelectric actuators was developed. The structure parameters of the bimorph mirror were optimized by numerical simulation, and the bimorph mirror was fabricated by domestic technology. The test results show that the surface profile error and slope error of the bimorph mirror can be reduced to 1.38 nm (rms) and 240 nrad (rms), thus the nanoscale control of the mirror surface profile was realized.
- bimorph mirror/
- surface profile error/
- synchrotron radiation/
- adaptive optics

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图 1双压电片变形镜示意图

Figure 1.Schematic diagram of bimorph mirror

下载: 全尺寸图片幻灯片

图 2PZT促动能力（红）、PZT表面弯曲对反射镜面形造成的影响（黑）与PZT厚度关系

Figure 2.Relationship between the thickness of PZT and the actuation capacity of PZT (red) as well as that between the thickness of PZT and the influence of PZT’s bend on mirror surface (black)

下载: 全尺寸图片幻灯片

图 3装配后的压电片变形镜

Figure 3.Assembled bimorph mirror

下载: 全尺寸图片幻灯片

图 4100 V电压下的响应曲线

Figure 4.Response curve under 100 V voltage

下载: 全尺寸图片幻灯片

图 5反射镜封装与校正前后面形

Figure 5.Mirror surfaces at different stages

下载: 全尺寸图片幻灯片

图 6斜率误差曲线

Figure 6.Slope error curve

下载: 全尺寸图片幻灯片

表 1变形镜材料参数

Table 1.Material parameters of bimorph mirror

材料	尺寸/mm³	密度/(kg·m⁻³）	泊松比	杨氏模量/MPa
Si	200×55×10	2329	0.28	170000
PZT	200×17.5×d	7500	0.34	63000

下载: 导出CSV

表 2变形镜重复性

Table 2.Repeatability of bimorph mirror

时间/天	0	1	2	3	4
PV/nm	3.75	3.92	3.44	4.03	3.68
rms/nm	1.38	1.53	1.21	1.65	1.51

下载: 导出CSV

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