短波中波红外折反射式共口径光学系统设计

马洪涛; 韩冰; 许洪刚; 李旭; 张明亮

doi:10.37188/CO.2024-0154

短波中波红外折反射式共口径光学系统设计

doi: 10.37188/CO.2024-0154

cstr: 32171.14.CO.2024-0154

马洪涛^1,,
韩冰^{1, 2, ,},
许洪刚¹,
李旭¹,
张明亮¹

1.
中国科学院长春光学精密机械与物理研究所, 吉林省长春市 130033
2.
长春理工大学, 吉林省长春市 130022

基金项目: 吉林省科技发展计划重点科技研发项目（No. E11802U3Z0）；可见光、中波及长波红外MTF测试仪（No. E35231X3ZZ）

详细信息

作者简介:
马洪涛（1980—），男，吉林长春人，硕士，副研究员，硕士生导师，2006年于哈尔滨工业大学航天学院获得工学硕士学位，主要从事航天光机系统设计、检测、装调方面的研究。E-mail：mhtgjs@163.com

韩　冰（1981—），男，吉林长春人，博士研究生，正高级工程师，2004年于吉林大学物理学院获得理学学士学位，2024年于长春理工大学光电工程学院攻读博士学位，主要从事光学检测技术研究与检测设备研发工作。E-mail：hanbing@ciomp.ac.cn

中图分类号: O435
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出版历程
- 网络出版日期: 2024-10-25

Design of SWIR/MWIR catadioptric common-aperture optical system

1.
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
2.
Changchun University of Science and Technology, Changchun 130022, China

Funds: Supported by Jilin Province science and technology development plan key research and development project (No. E11802U3Z0); Visible, medium and long wave infrared MTF tester (No. E35231X3ZZ)

More Information

Corresponding author: hanbing@ciomp.ac.cn

摘要

摘要:
为了实现高精度、高可靠性的动态场景模拟，设计了一套短波中波多波段折反射式共口径光学系统。该系统结合了反射、折射和共口径光路的优势，分为主光学系统、短波光学系统和中波光学系统独立设计，根据理论计算得到光学系统的初始结构，再通过光学设计软件对光学参数进一步细化，最后，按照光瞳匹配原则，组合各分系统，并对系统的成像质量作进一步优化设计，通过调制传递函数（Modulation Transfer Function，MTF）和畸变等指标的仿真验证了系统设计的合理性。所设计的短波光学系统视场角为±0.107°、焦距2500 mm、入瞳尺寸300 mm，MTF达到衍射极限，畸变小于0.3%；中波光学系统的视场角为±0.65°、焦距750 mm、入瞳尺寸300 mm，MTF接近衍射极限，畸变小于1%。该系统成像质量好，体积小，实用性强，在光电跟瞄和空间探测等领域具有较大应用潜力。
- 景物模拟器 /
- 光学设计 /
- 短波中波红外成像 /
- 共口径光学系统
Abstract:
In order to simulate dynamic scenes with high accuracy and high reliability, a short-wave infrared (SWIR) and mid-wave infrared (MWIR) multiband catadioptric common-aperture optical system is designed. The system combines the advantages of reflection, refraction and common-aperture optical path, and is independently designed into the main optical system, short-wave optical system and mid-wave optical system. The initial structure of the optical system is obtained according to theoretical calculation, and the optical parameters are further detailed by optical design software. Finally, according to the principle of pupil matching, the sub-systems are combined. The image quality of the system is further optimized and the rationality of the system design is verified by the simulation of modulation transfer function (MTF) and distortion. The designed short-wave optical system has a field angle of ±0.107°, a focal length of 2500mm, an entry pupil size of 300mm, MTF reaches the diffraction limit, and the distortion is less than 0.3%. The field angle of the mid-wave optical system is ±0.65°, the focal length is 750mm, the entry pupil size is 300mm, the MTF is close to the diffraction limit, and the distortion is less than 1%. The system has good image quality, small size and strong practicability, and has great application potential in the field of photoelectric tracking and space detection.
- scene simulator /
- optical design /
- SWIR/MWIR imaging /
- common-aperture optical system

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图 1 光学系统设计流程图

Figure 1. Optical system design flow chart

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图 2 主系统离轴两镜光学设计图

Figure 2. Main system off-axis two-mirror optical design

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图 3 主光学系统MTF曲线

Figure 3. Main optical system MTF curve

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图 4 中波主系统的光路形式

Figure 4. The optical path form of the mid-wave main system

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图 5 中波主光学系统MTF曲线

Figure 5. Mid-wave main optical system MTF curve

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图 6 短波后端光学系统设计图

Figure 6. Short-wave back-end optical system design

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图 7 短波后端光学系统MTF曲线

Figure 7. Short-wave back-end optical system MTF curve

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图 8 短波后端光学系统畸变曲线

Figure 8. Short-wave back-end optical system distortion curve

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图 9 中波后端系统光学设计图

Figure 9. Mid-wave back-end optical system design

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图 10 中波后端光学系统MTF曲线

Figure 10. Mid-wave back-end optical system MTF curve

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图 11 中波后端光学系统畸变曲线

Figure 11. Mid-wave back-end optical system distortion curve

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图 12 目标与背景模拟光学系统设计图

Figure 12. Optical system design for target and background simulation

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图 13 五路系统的MTF曲线

Figure 13. MTF curve of a five-way system curve

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图 14 五路系统的畸变曲线

Figure 14. Distortion curve of five-way system

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图 15 光线追迹渐晕分析

Figure 15. Ray tracing vignetting analysis

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表 1 折反射式共口径光学系统主要参数

Table 1. Main parameters of catadioptric common-aperture optical system

Num.	Specification	Short-wave system	Mid-wave system
1	Wave band/ μm	1.0-1.7	3.7-4.8
2	Channels	1	3.7-4.0，4.1-4.35， 4.35-4.6，4.55-4.8
3	FOV/ω	±0.107°	±0.65°
4	Focus/mm	2500	750
5	Entrance PD/mm	300	300
6	Exit PD/mm	1300	1300
7	Image size	/	The same size/4
8	Distortion	≤0.3%	≤1%
注：Entrance PD= Entrance Pupil Diameter，入瞳尺寸；Exit PD=Exit Pupil diameter，出瞳距离。

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表 2 主系统光学设计数据

Table 2. Main system optical design data

Mirror Num.	Curve radius /mm	Distance /mm	Semi-diameter /mm	Off-axis /mm
1	−1500	−900	170	300
2	300		40	−58

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表 3 中波主系统光学设计数据

Table 3. Mid-wave main system optical design data

Mirror Num.	Curve radius /mm	Distance /mm	Semi-diameter /mm	Off-axis /mm
1	−1500.00	−900	170.00	300
2	300.00		40.00	−58
3	207.93	19	33.33	KBR
4	−128.33	0.50	33.10	KBR
5	−754.76	10	32.36	SILICON
6	776.51	0.50	32.13	SILICON
7	234.00	20	32.19	KBR
8	−89.34	0	31.84	KBR
9	−89.34	17.20	31.84	GAAS
10	−148.50	200	35.36	GAAS

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表 4 短波后端系统的光学参数

Table 4. Optical parameters of short-wave back-end system

Num.	Specification	Short-wave system
1	Wave band/ μm	1.0-1.7
2	FOV/ω(°)	±0.54
3	Focus/mm	500
4	Entrance PD/mm	60
5	Image size	/
6	Distortion	≤0.3%

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表 5 短波后端光学系统设计参数

Table 5. Short-wave back-end optical system design parameters

Mirror Num.	Curve radius /mm	Distance /mm	Semi-diameter /mm	Materials
1	229.09	20	50.61	H-LAF55
2	−192.78	4.31	49.90	H-LAF55
3	−177.10	12	48.22	H-LAF50B
4	−1950.66	6.70	46.73	H-LAF50B
5	−533.78	11	45.87	H-ZF88GT
6	476.42	35.99	45.19	H-ZF88GT
7	−4768.94	10	45.16	H-LAF55
8	−329.67	436.70	45.19	H-LAF55

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表 6 中波后端系统的光学参数

Table 6. Optical parameters of mid-wave back-end system

Num.	Specification	Mid-wave system
1	Wave band/ μm	3.7-4.8
2	FOV/ω	±3.23°
3	Focus/mm	150
4	Entrance PD	60
5	Image size	The same size/4
6	Distortion	≤1%

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表 7 中波后端光学系统设计参数

Table 7. Mid-wave back-end optical system design parameters

Mirror Num.	Curve radius /mm	Distance /mm	Semi-diameter /mm	Materials
1	168.31	29.02	47.50	SILICON
2	229.17	9.64	42.54	SILICON
3	6736.72	15.00	41.43	GERMANIUM
4	773.91	102.20	40.61	GERMANIUM
5	820.84	26.25	35.63	SILICON
6	−330.43	7.58	34.56	SILICON
7	−214.63	18.00	31.30	GERMANIUM
8	−446.58	0.10	31.49	GERMANIUM
9	79.49	22.50	30.22	SILICON
10	69.43	230.28	23.24	SILICON

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表 8 加工与装调公差

Table 8. Machining and fitting tolerances

Num.	Tolerance classification	Tolerance value
1	Aperture	2
2	Thickness (spacing)/mm	0.02
3	Refractive index	0.0003
4	Dispersion coefficient	0.005
5	Local aperture	0.2
6	Single-mirror tilt/(′)	1

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