Determination of optimum positions of incident spherical wave and reference spherical wave in testing aspheric surface
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摘要:为了能够对非球面光学元件面型进行高精度的干涉检测,提出了一种确定最佳入射球面波和最佳参考球面波的新方法。该方法通过计算分析入射球面波与非球面反射波干涉条纹密度,确定最佳入射球面波的波源位置;通过计算分析在干涉图记录平面CCD上干涉条纹的密度,确定非球面检测时参考球面波波源的最佳位置。应用该理论与方法,不仅可明确非球面检测时CCD等光路元件选型的具体策略,而且可用于指导非球面检测调试过程,并能够通过对干涉图的深入分析,获得更多被测非球面的信息。Abstract:To test an aspheric surface with an interference way in high-precision, a new method for determining the optimum positions of incident spherical wave source and reference spherical wave source are proposed. The optimal position of incident spherical wave source is determined by calculating the interferometric fringe density between incident spherical wave and aspherical reflective wave and that of the reference spherical wave source is obtained from calculating the interferometric fringe density on a CCD. On the theoretical basis of this research, the specific strategies of selecting CCDs and optical components can be determined and the interferogram can be fully analyzed to get much information about tested aspheric surfaces. It is shown that the research results can be used for theoretically guiding the debugging process of testing aspheric surfaces.
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