SU-8光刻胶应变分布光学全场检测方法 -

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SU-8光刻胶应变分布光学全场检测方法

doi:10.3788/CO.20160903.0379

合肥工业大学仪器科学与光电工程学院, 安徽合肥 230009

基金项目:

国家自然科学基金资助项目No.51375136

中航产学研专项资助项目No.CXY2013HFGD22

详细信息

作者简介:
王鑫(1990-),女,安徽安庆人,硕士研究生,2013年于合肥工业大学获得学士学位,主要从事剪切散斑干涉技术方面的研究。E-mail:wangxinqj@126.com

通讯作者:
王永红(1972—)，男，安徽合肥人，博士后，教授，研究生导师，1994年于合肥工业大学获得学士学位,1997年于中科院安徽光机所获得硕士学位，2004年于合肥工业大学获得博士学位，主要从事精密测试技术及仪器、光电检测、机器视觉等方面的研究。E-mail:yhwang@hfut.edu.cn

中图分类号:TP394.1;TH691.9
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出版历程
- 收稿日期:2016-02-12
- 修回日期:2016-03-18
- 刊出日期:2016-05-25

Whole field optical detection method of strain distribution of SU-8 photoresist

School of Instrument Science and Opto-electronic Engineering, Hefei University of Technology, Hefei 230009, China

Funds:

Supported by National Natural Science Foundation of ChinaNo.51375136

Special Project of University & Research of AVICNo.CXY2013HFGD22

摘要

摘要:由于SU-8光刻胶的内应力将会影响高深宽比结构的全金属光栅的制作质量,本文针对近年来SU-8光刻胶应力测量困难的情况,提出了一种基于剪切散斑干涉技术的SU-8光刻胶应变分布测量的新方法。该方法通过对被测胶体加载前后两幅干涉图像的处理,直接得到被测胶体结构的全场应变分布情况,由胶体的应变变形数据即可反映出内应力的变化和分布趋势。同时使用ANSYS有限元分析软件对同一被测胶体进行应变仿真模拟研究,获得胶体结构的变形场仿真数据。组建了实验系统,进行了实验验证,结果表明:实际测量变形量约为1.189 μm,仿真的最大变形量为1.088 μm,测量误差在允许范围内,且测量的形变趋势与仿真模拟结果相一致,表明剪切散斑干涉技术可应用于SU-8光刻胶的应变分布全场无损检测。
- 剪切散斑干涉/
- SU-8光刻胶/
- 应力分布/
- 应变/
- 仿真模拟
Abstract:The quality of full metal grating is affected by internal stress of SU-8 photoresist. Considering the stress measurement of SU-8 photoresist is difficult in recent years, the shearography is applied to measure the strain distribution of SU-8 photoresist which corresponds to the stress distribution of SU-8 photoresist. Strain distribution is acquired by processing interferometer images which are recorded before and after loading on the tested photoresist. The simulation result of the same photoresist is obtained by using the ANSYS finite element analysis software. The shearography measurement system is setup and demonstration experimental is carried out. The deformation of actual measurement is about 1.189 μm, and the deformation of simulation is 1.088 μm. The measurement error is in the allowed range. The deformation trend of experimental result is consistent with the simulation result. Results show that the shearography in SU-8 photoresist strain distribution measurement is valid and may be applied to measure whole field strain distribution of SU-8 photoresist in lossless.
- shearography/
- SU-8 photoresist/
- stress distribution/
- strain/
- simulation

HTML全文

图 1 剪切散斑干涉原理

Figure 1.Principle diagram of laser shearing speckle interference

下载: 全尺寸图片幻灯片

图 2相位条纹及形变量分布

Figure 2.Phase map and curve of shpae variable distribution

下载: 全尺寸图片幻灯片

图 3涂覆光刻胶的铜片

Figure 3.Photoresist on the sheet copper

下载: 全尺寸图片幻灯片

图 4剪切散斑干涉测量装置

Figure 4.Shearing speckle interferometry device

下载: 全尺寸图片幻灯片

图 5胶体变形的相位条纹

Figure 5.Phase map of the photoresist deformation

下载: 全尺寸图片幻灯片

图 6黑线区域的变形量

Figure 6.Deformation of the measuring result in the black line

下载: 全尺寸图片幻灯片

图 7胶体结构变形仿真ANSYS有限元分析图

Figure 7.ANSYS simulation of photoresist structure deformation

下载: 全尺寸图片幻灯片

表 1材料的性能参数

Table 1.Performance parameters of the materials

Material	Density/(g·cm^-3)	Modulus of elasticity/GPa	Poisson′s ratio	Coefficient of expansion.(10^-6·℃^-1)
Cu	8.8	110	0.35	18.5
SU-8	1.0	-	0.22	52.0

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