高反射光学薄膜损伤研究进展 -

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高反射光学薄膜损伤研究进展

doi:10.3788/CO.20181106.0931

长春理工大学高功率半导体国家重点实验室, 吉林长春 130022

基金项目:

国家青年基金项目21707010

长春理工大学科技创新基金XJJLG-2016-07

长春理工大学青年基金XQNJJ-2015-10

详细信息

作者简介:
董家宁(1993-), 男, 江苏淮安人, 硕士研究生, 2016年于江苏科技大学获得学士学位, 主要从事光电子技术与应用方面的研究。E-mail:779070319@qq.com
范杰(1982—)，男，吉林延边人，博士，助理研究员，2007年于吉林大学获得硕士学位，2013年于电子科技大学获得博士学位，主要从事光电子技术与应用方面的研究。E-mail:fanjie@cust.edu.cn

中图分类号:TB43
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出版历程
- 收稿日期:2017-12-30
- 修回日期:2018-02-21
- 刊出日期:2018-12-01

Research progress in laser damage of high reflective optical thin films

State Key laboratory of High-power Semiconductor Laser, Changchun University of Science and Technology, Changchun 130022, China

Funds:

the National Science Foundation for Young Scientists of China21707010

the Innovation Science Foundation of Changchun University of Science and TechnologyXJJLG-2016-07

the Youth Science Foundation of Changchun University of Science and TechnologyXQNJJ-2015-10

More Information

Corresponding author:FAN Jie, E-mail:fanjie@cust.edu.cn

摘要

摘要: 诱导损伤阈值是大功率光学系统中重要参数，其数值大小对系统的输出功率与稳定性具有重要影响。为了突破损伤阈值对光学系统输出功率的限制，科研人员主要从制备薄膜工艺、特性、薄膜特性以及薄膜后工艺等方面开展研究。本文介绍了高反膜理论、制备工艺；综述了近十年来国内外对高反膜损伤研究的成果；阐述了特性、薄膜特性以及薄膜后工艺对薄膜损伤阈值的影响。在此基础上，对提高高反膜损伤阈值的研究和发展趋势进行了分析与展望。
- 损伤/
- 光学薄膜/
- 高反膜/
- 损伤阈值
Abstract:The laser-induced damage threshold is an important parameter in high-power optical systems, and it has an important influence on the output power and stability of laser system. In order to break through the limitation of the damage threshold on the output power of the laser optical system, researchers have carried out research mainly on film preparation, laser characteristics, film properties and thin film post-treatment. In this paper, the theory and preparation of high reflective film are introduced; the research results of high anti-membrane damage at home and abroad in the past decade are reviewed; the effects of laser characteristics, thin film properties and thin film post-treatment on the film damage threshold are also discussed. On this basis, the research and development trend of improving high reflective film damage threshold are analyzed and prospected.
- laser damage/
- optical film/
- high reflective film/
- damage threshold

HTML全文

图 11 064 nm波长、12 ns脉宽损伤的薄膜形貌^[14]

Figure 1.Morphology of damage film induted by laser with wavelength of 1 064 nm and pulse width of 12 ns^[14]

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图 2自由电子产生的过程^[15]

Figure 2.Generation process of free electron^[15]

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图 3损伤阈值随波长变化^[21]

Figure 3.Damage threshold varies with wavelength^[21]

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图 4具有中间态的Ta₂O₅能级图^[28]

Figure 4.Energy level of Ta₂O₅with intermediate states^[28]

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图 5脉冲重复频率与损伤阈值之间的关系^[30]

Figure 5.Damage threshold vs pulse repetition frequency^[30]

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图 6(HL)⁸HLH，(HL)⁸H2LH以及(HL)⁸H1.845LH场强分布^[33]

Figure 6.Field intensity distributions of(HL)⁸HLH, (HL)⁸H2LH and(HL)⁸H1.845LH^[33]

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图 7薄膜电场分布^[35]

Figure 7.Film electric field distribution^[35]

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图 8实验测量与理论预测结果比较。H表示四分之一波长(λ=1 030 nm)厚度^[38]

Figure 8.Comparison between experimental measurement and theoretical prediction. H represents a quarter wavelength(λ=1 030 nm) thickness^[38]

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图 9两套薄膜电场分布^[43]

Figure 9.Electric field distributions of two sets of films^[43]

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图 10不同温度下裂纹密度^[52]

Figure 10.Crack densities at different temperatures^[52]

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图 11不同材料保护膜结构^[58]

Figure 11.Structures of protective film with different materials^[58]

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图 12高反膜的TEM图和高折射率层(HfO₂)材料的电子衍射图^[56]

Figure 12.TEM image of the high reflective coating and the electron diffraction pattern of the high refractive index layer(HfO₂) material^[56]

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图 13损伤阈值测试光路^[61]

Figure 13.Test light path of damage threshold^[61]

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表 120 μm、1 000 μm光斑直径时，辐照入射角对损伤阈值的影响^[19]

Table 1.Influence of incidence irradiation angle on damage threshold at 20 μm and 1 000 μm spot diameter^[19]

	Max EFI at interface	Normalized LIDT(1-on-1)
	Max EFI at interface	Small beam size(20 μm)	Large beam size(1 000 μm)
0° HR coating	91%	1	1
65° S-pol HR coating	20%	3.5	0.45

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表 2不同退火温度下的晶粒尺寸与损伤阈值^[50]

Table 2.Grain sizes and damage thresholds at different annealing temperatures^[50]

Annealing temperature/℃	Grain size/nm	LIDT/(J·cm^-2)
as-deposited	17±2	44.1±3.8
300	18±1	60.7±6.4
400	24±1	76.6±3.2
500	32±3	57.5±3.2

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表 3国内外高反膜损伤研究成果

Table 3.Research results of high reflective film damage at home and abroad

年份	单位	特性	薄膜材料	损伤阈值/(J·cm^-2)
2010^[63]	同济大学	1 064 nm、3 ns	HfO₂、SiO₂	105.2
2011^[64]	汉诺威中心	1 064 nm、12 ns	HfO₂与Al₂O₃按一定比例混合、SiO₂	175
2014^[65]	同济大学	1 064 nm、10 ns	HfO₂、SiO₂	234
2015^[66]	布赫斯技术学院	1 064 nm、5.5 ns	Ta₂O₅、SiO₂	90
2016^[67]	科罗拉多州立大学	1 030 nm、4 ns	Ta₂O₅、HfO₂、SiO₂	174
2016^[61]	同济大学	1 064 nm、10 ns	未知	＞167

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