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摘要:电子传输层对于钙钛矿太阳能电池载流子的抽取与传输起着至关重要的作用，氧化锡由于其优异特性被作为电子传输层广泛应用于正式平板结构钙钛矿太阳能电池中。而目前制备氧化锡薄膜的工艺方法无法满足大面积、自动化等工业需求，亟待发掘新的工艺手段。为解决此问题，本文使用喷涂法成功制备了高质量的氧化锡薄膜。实验结果表明，基于喷涂法制备氧化锡薄膜的钙钛矿太阳能电池对于氧化锡薄膜的厚度有较高的依赖性，通过优化薄膜厚度，电池的光电转化效率可达到15.72%；喷涂得到的氧化锡薄膜存在咖啡环现象，使得串联电阻提高，限制了光电转化效率，但可以通过进一步细化液滴来解决。本文为钙钛矿产业化进程中高质量氧化锡薄膜的制备提供了新的思路与方法。Abstract:The electron transport layer(ETL) plays a crucial role in carrier extraction and transportation in perovskite solar cells. Tin(Ⅳ) oxide is widely used as ETL-material in planar perovskite solar cells due to its excellent properties. However, current processes for tin oxide film preparation can hardly meet industrial requirements, such as large-scale and automatic fabrication. Therefore, developing a new fabrication method suitable for industrialization is in urgent demanded. To solve this problem, a high-quality tin oxide film was successfully created using the spray coating method. Experimental results show that the performance of the perovskite solar cells is highly dependent on the thickness of the spray-coated tin oxide film. By optimizing film thickness, power conversion efficiency(PCE) can be improved to 15.72%. The film exhibits a coffee ring phenomenon, which increases the series resistance and limits the PCE. That can be solved by further decreasing the size of the droplets. This paper demonstrates a new method for the fabrication of high-quality, highly adaptable tin oxide films for the industrialization of perovskite solar cells.
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图 3(a) 器件性能与喷涂时间的关系；(b)器件的J-V曲线图
Figure 3.(a)Relation between device performance and spraying time; (b)J-V curve of the device with optimal performance
图 4器件串联电阻、并联电阻与喷涂时间的关系
Figure 4.Relation between the series resistance, shunt resistance of solar cells and spraying time
图 5基于最优化喷涂氧化锡(1)与基于旋涂氧化锡(2)的器件电化学阻抗Nyquist谱图
Figure 5.Nyquist plots for EIS measurement of optimal spray-coating-SnO2-based and spin-coating-SnO2-based solar cells
图 6在最优化条件下的喷涂氧化锡扫描电子显微镜图谱
Figure 6.SEM image of spraying SnO2under optimized condition
图 7(a) 喷涂时间为40 s和(b)喷涂时间为80 s的氧化锡薄膜光学显微镜图谱
Figure 7.Optical microscopic images of spray-coating SnO2with spraying time of (a)40 s and 80 s(b)
表 1不同喷涂时间下氧化锡器件的光电性能
Table 1.Photoelectric performance of devices with spray-coating SnO2films prepared with different spraying time
Time/s Voc/V Jsc/(A·cm-2) PCE/% FF/% 40 0.84 13.02 3.80 34.62 50 0.95 21.87 13.03 62.87 55 1.02 22.03 15.72 70.03 80 0.87 18.65 6.87 42.16 
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表 2两种工艺之间最优器件性能对比
Table 2.Photoelectrical performance comparison for the devices prepared by spinning coating and spraying coating devices
Type Voc/V Jsc/(A·cm-2) PCE/% FF/% Spinnig coating 1.04 22.43 18.14 77.48 Spraying coating 1.02 22.03 15.72 70.03 下载:
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