电子束蒸发和离子束溅射HfO<sub>2</sub>紫外光学薄膜 -

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电子束蒸发和离子束溅射HfO₂紫外光学薄膜

中国科学院长春光学精密机械与物理研究所,吉林长春130033

基金项目:

国家重大科技专项

详细信息

作者简介:
邓文渊(1974—),男,江西赣州人,副研究员,主要从事紫外及深紫外薄膜光学器件的制备与表征方面的研究。E-mail:dwy101@yahoo.com.cn

中图分类号:O484.4
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出版历程
- 收稿日期:2010-07-12
- 修回日期:2010-09-14
- 刊出日期:2010-12-20

Ultraviolet HfO₂thin film by e-beam evaporation and ion beam sputtering

Changchun Institute of Optics,Fine Mechanics and Physics, Chinese Academy of Sciences,Changchun 130033,China

摘要

摘要:HfO2薄膜在紫外光学中具有十分重要的地位,不同方法制备的HfO2薄膜特性不同,可以满足不同的实际应用需求。本文分别利用电子束蒸发和离子束溅射方法制备了用于紫外光区域的HfO2薄膜,并对薄膜的材料和光学特性进行了表征与比较。通过对单层HfO2薄膜的实测透射和反射光谱进行数值反演,得到了HfO2薄膜在230~800 nm波段的折射率和消光系数色散曲线,结果表明两种方法制备的HfO2薄膜在250 nm的消光系数均小于210-3。在此基础上,制备了两种典型的紫外光学薄膜元件(紫外低通滤波器和240 nm高反射镜),其光谱性能测试结果表明,两种不同方法制备的器件均具有较好的光学特性。
- 薄膜光学/
- 电子束蒸发/
- 离子束溅射/
- 高反射镜/
- X射线衍射术/
- X射线光电子能谱
Abstract:HfO2 thin film is one of the most important films for optical applications in ultraviolet optics. As different fabrication methods will result in the different properties, it is essential to choose appropriate fabrication methods for practical applications. In this paper, HfO2 thin film for ultraviolet optics was fabricated by e-beam evaporation and ion beam sputtering, respectively. The material and optical properties of HfO2 thin film were measured and compared. The refractive index n and extinction coefficients k of HfO2 thin films were obtained by numerically fitting the measured transmittance and reflectance curves in the wavelength of 230-800 nm. Obtained results indicate that both the extinction coefficients from e-beam evaporation and ion beam sputtering are less than 210-3. On the basis of above works, two kinds of typical ultraviolet optics, violet low pass filter and 240 nm high reflector, were fabricated by e-beam evaporation and ion beam sputtering, respectively, and both of the devices have high spectral properties.
- film optics/
- e-beam evaporation/
- ion beam sputtering/
- High Reflector(HR)/
- X-ray Diffractometry(XRD)/
- X-ray Photoelectron Energy Spectra(XPS)

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