Citation: | DU Ying, CHEN MeiRui, LIU YuTong, CAO ZongXin, MAO HongMin, LI XiaoPing, SUN HuiJuan, CAO ZhaoLiang. Design and fabrication of liquid crystal wavefront corrector based on mask lithography[J].Chinese Optics.doi:10.37188/CO.2023-0137 |
Liquid crystal wavefront correctors (LCWFCs) have the high development cost and customization difficulty as they are usually fabricated based on the process technology of liquid crystal displays. In the paper, to achieve specialized and low-cost development of LCWFCs, it is fabricated with the mask lithography method. Firstly, a 91 pixels passive liquid crystal driving electrode was designed and prepared based on mask lithography technology and then, packaged as a liquid crystal optical correction unit. Then, a driver connection circuit board was designed and prepared to connect the optical correction unit and the driving circuit board. Next, the response characteristics of the LCWFC were tested, and the results show that the phase modulation is 5.5λ, and the response time is 224 ms. Finally, the spherical waves are generated and the static tilt aberrations are corrected based on Zygo interferometer. The results show that the LCWFC can generate positive and negative defocused wavefronts. Further, after correction of the horizontal tilt aberration, the coefficient of the first term of the Zernike polynomials is decreased from 1.18 to 0.16. Therefore, the aberration is corrected with the amplitude of 86%. This work may provide new ideas for the development of LCWFCs, and then expanding their application fields and scenarios.
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