Sep. 2014

Article Contents

Chinese Optics> 2014> 7(5): 808-815.

CAI Xi-kun, ZHANG Li-chao, MEI Lin, SHI Guang. Optical properties of LaF3 thin films prepared by thermal evaporation and ion beam sputtering[J]. Chinese Optics, 2014, 7(5): 808-815. doi: 10.3788/CO.20140705.0808

Citation:

CAI Xi-kun, ZHANG Li-chao, MEI Lin, SHI Guang. Optical properties of LaF₃thin films prepared by thermal evaporation and ion beam sputtering[J].Chinese Optics, 2014, 7(5): 808-815.doi:10.3788/CO.20140705.0808

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Optical properties of LaF₃thin films prepared by thermal evaporation and ion beam sputtering

doi:10.3788/CO.20140705.0808

State Key Laboratory of Applied Optics, Chaugchuu lustatute of Optics, Fame Mechauacs and Physics Chaua Academy of Sciences, Chaugchuu 130033, China

Received Date:15 Apr 2014
Rev Recd Date:18 Jul 2014
Publish Date:25 Sep 2014

Abstract

Abstract

To meet the requirements for different practical applications, we investigate the properties of single LaF3 layer deposited by resistive heating Mo-boat(RH) and ion beam sputtering(IBS) in this paper. First, transmittance and reflectance spectra of LaF3 thin films were measured by an UV-visible spectrophotometer, and the refractive indexes and extinction coefficients were obtained by using different models. Second, stress-temperature curves of LaF3 thin films during heating and cooling cycles were carried out by a stress measurement system. Finally, the X-ray diffraction(XRD) was used to characterize the microstructure of LaF3 layers. Experimental results indicate that LaF3 thin film fabricated by thermal evaporation(RH LaF3) had an inhomogeneous refractive index; the refractive index and extinction coefficient at 193 nm are 1.687 and 510-4 for RH LaF3, and 1.714 and 910-4for IBS LaF3, respectively. RH LaF3 and IBS LaF3 exhibited inverse stress status. RH LaF3 had a tensile stress and IBS LaF3 showed a compressive stress, which decreased after annealing. The transmittances are 99.4% and 99.2% for RH deposited MgF2/LaF3 AR coating and IBS deposited AlF3/LaF3 AR coating, and the corresponding measured reflectances are 0.04% and 0.1%,respectively.
- thin films,
- LaF3,
- thermal evaporation,
- ion beam sputtering,
- stress,
- AR

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References (1)

References

[1] 柳强, 闫兴鹏, 陈海龙, 等. 高功率全固态紫外器研究新进展[J]. 中国 , 2010, 37(9):2289-2298. LIU Q, YAN X P, CHENG H L,et al. New progress in high-power all-solid-state ultraviolet laser[J].Chinese J. Lasers, 2010, 37(9):2289-2298.(in Chinese)
[2] 李玉瑶, 王菲, 焦正超, 等. 高效率LD 端面抽运准连续355 nm 器[J]. 发光学报, 2014, 35(3):332-336. LI Y Y, WANG F, JIAO ZH CH,et al. High efficient LD end-pumped QCW 355 nm laser[J].Chinese J. Luminescence, 2014, 35(3):332-336.(in Chinese)
[3] 汪丽杰, 佟存柱, 曾玉刚, 等. 高亮度布拉格反射波导器[J]. 发光学报, 2013, 34(6):787-791. WANG L J, TONG C ZH, ZENG Y G,et al. High brightness Bragg reflection waveguide laser[J].Chinese J. Luminescence, 2013, 34(6):787-791.(in Chinese)
[4] 申德振, 梅增霞, 梁会力, 等.氧化锌基材料、异质结构及光电器件[J]. 发光学报, 2014, 35(1):1-60. SHEN D ZH, MEI Z X, LIANG H L,et al. ZnO-based material, heterojunction and photoelectronic device[J].Chinese J. Luminescence, 2014, 35(1):1-60.(in Chinese)
[5] 张立超, 高劲松. 长春光机所深紫外光学薄膜技术研究进展[J]. 光学精密工程, 2012, 20(11):2395-2401. ZHANG L CH, GAO J S. Developments of DUV coating technologies in CIOMP[J].Opt. Precision Eng., 2012, 20(11):2395-2401.(in Chinese)
[6] SUN J, LI X, ZHANG W L,et al. Effects of substrate temperatures and deposition rates on properties of aluminum fluoride thin films in deep-ultraviolet region[J].Applied Optics, 2012, 51(35):8481-8489.
[7] LEE C C, LIAO B H, LIU M C. AlF₃thin films deposited by reactive magnetron sputtering with Al target[J].Optics Express, 2007, 15(15):9152-9156.
[8] BISCHOFFM, SODEM, GBLERD. Metal fluoride coatings prepared by ion-assisted deposition[J].Advances in Optical Thin Films Ⅲ, 2008, 71010L:1-10.
[9] TOSHIYAY, KEIJIN, KEⅡCHIS,et al. Fluoride antireflection coatings for deep ultraviolet optics deposited by ion-beam sputtering[J].Applied Optics, 2006, 45(7):1375-1379.
[10] ATANASSOV G, TURLO J, FU J K,et al. Mechanical, optical and structural properties of TiO₂and MgF₂thin films deposited by plasma ion assisted deposition[J].Thin Solid Films, 1999, 342(1-2):83-92.
[11] 时光, 梅林, 高劲松, 等. 离子束溅射、热舟和电子束法制备深紫外LaF₃薄膜[J]. 技术, 2013, 37(5):592-595. SHI G, MEI L, GAO J S,et al. DUV LaF₃thin film deposited by IBS, thermal boat and electron beam evaporation[J].Laser Technology, 2013, 37(5):592-595.(in Chinese)
[12] 时光, 梅林, 张立超. 球面元件表面AlF₃薄膜的光学特性和微观结构表征[J]. 中国光学, 2013, 6(6):906-911. SHI G, MEI L, ZHANG L CH. Characterization of optical and microstructural properties of AlF₃thin films deposited on spherical element[J].Chinese Optics, 2013, 6(6):906-911.(in Chinese)
[13] BISCHOFF M, GBLERD, KAISERN,et al. Optical and structural properties of LaF₃thin films[J].Applied Optics, 2008, 47(13):c157-c161.
[14] AL-KUHAILIM F, KHAWAJAE E, DURRANISM A. Determination of the optical constants of inhomogeneous thin films with linear index profiles[J].Applied Optics, 2006, 45(19):4591-4597.
[15] ODE, AIKO. Ion beam sputtering deposition of fluoride thin films for 193 nm applications[J].Optical Interference Coatings, 2013, FC.8.
[16] 唐晋发, 顾培夫, 刘旭, 等.现代光学薄膜技术[M]. 杭州:浙江大学出版社, 2006, 330-332. TANG J F, GU P F, LIU X,et al. Modern Optical Thin Film Technology[M]. Hangzhou:Zhejiang University Press, 2006, 330-332.(in Chinese)
[17] JACOB D, PEIR F, QUESNELE,et al. Microstructure and composition of MgF₂optical coatings grown on Si substrate by PVD and IBS processes[J].Thin Solid Films, 2000, 360, 1-2:133-138.
[18] 郭春, 林大伟, 张云洞. 光度法确定LaF₃薄膜光学常数[J]. 光学学报, 2011, 31(7):0731001-1-7. GUO C, LIN D W, ZHANG Y D,et al. Determination of optical constants of LaF₃Films from spectrophotometric measurements[J].Acta Optica Sinica, 2011, 31(7):0731001-1-7.(in Chinese)
[19] GUO C, KONG M D, GAO W D. Simultaneous determination of optical constants, thickness, and surface roughness of thin film from spectrophotometric measurements[J].Optics Letters, 2013, 38(1):40-42.
[20] WANG Y, ZHANG Y G, CHEN, W L,et al. Optical properties and residual stress of YbF₃thin films deposited at different temperatures[J].Applied Optics, 2008, 47(13):C319-C323.
[21] LIU M C, LEE C C, KANEKO M,et al. Influence of ion assistance on LaF₃films deposited by molybdenum boat evaporation[J].Applied Optics, 2012, 51(15):2865-2869.
[22] MARTIN B, TOBIAS N, OLIVER V,et al. Post-deposition treatment of IBS coatings for UV applications with optimized thin-film stress properties[J].Applied Optics, 2014, 53(4):A212-A220.