May 2016

Article Contents

Chinese Optics> 2016> 9(3): 379-384.

WANG Xin, WANG Yong-hong, LYU You-bin, LU Yi-ru, TU Si-qi. Whole field optical detection method of strain distribution of SU-8 photoresist[J]. Chinese Optics, 2016, 9(3): 379-384. doi: 10.3788/CO.20160903.0379

Citation:

WANG Xin, WANG Yong-hong, LYU You-bin, LU Yi-ru, TU Si-qi. Whole field optical detection method of strain distribution of SU-8 photoresist[J].Chinese Optics, 2016, 9(3): 379-384.doi:10.3788/CO.20160903.0379

Citation:

WANG Xin, WANG Yong-hong, LYU You-bin, LU Yi-ru, TU Si-qi. Whole field optical detection method of strain distribution of SU-8 photoresist[J].Chinese Optics, 2016, 9(3): 379-384.doi:10.3788/CO.20160903.0379

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Whole field optical detection method of strain distribution of SU-8 photoresist

doi:10.3788/CO.20160903.0379

School of Instrument Science and Opto-electronic Engineering, Hefei University of Technology, Hefei 230009, China

Funds:

Supported by National Natural Science Foundation of ChinaNo.51375136

Special Project of University & Research of AVICNo.CXY2013HFGD22

Received Date:12 Feb 2016
Rev Recd Date:18 Mar 2016
Publish Date:25 May 2016

Abstract

Abstract

The quality of full metal grating is affected by internal stress of SU-8 photoresist. Considering the stress measurement of SU-8 photoresist is difficult in recent years, the shearography is applied to measure the strain distribution of SU-8 photoresist which corresponds to the stress distribution of SU-8 photoresist. Strain distribution is acquired by processing interferometer images which are recorded before and after loading on the tested photoresist. The simulation result of the same photoresist is obtained by using the ANSYS finite element analysis software. The shearography measurement system is setup and demonstration experimental is carried out. The deformation of actual measurement is about 1.189 μm, and the deformation of simulation is 1.088 μm. The measurement error is in the allowed range. The deformation trend of experimental result is consistent with the simulation result. Results show that the shearography in SU-8 photoresist strain distribution measurement is valid and may be applied to measure whole field strain distribution of SU-8 photoresist in lossless.
- shearography,
- SU-8 photoresist,
- stress distribution,
- strain,
- simulation

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References (15)

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